| Автор | Nakayama, Tomonari |
| Автор | Ueda, Mitsuru |
| Дата выпуска | 1999 |
| dc.description | Mono-substituted hydroquinone calix[8]arenes 1a and 1b were synthesized by the debenzylation of O-substituted p-benzyloxyphenol calix[8]arenes which were prepared by the cyclization of p-benzyloxyphenol and paraformaldehyde in the presence of a base, followed by acylation with acetic anhydride or toluene-p-sulfonyl chloride. The calixarenes provide highly transparent films from their solutions in ethyl lactate (EL). A new positive-type photoresist based on the calix[8]arene 1b having toluene-p-sulfonate groups as a base-developable matrix and diazonaphthoquinone-4-sulfonate [DNQ(4)] or -5-sulfonate [DNQ(5)] as a photoreactive dissolution inhibitor has been successfully developed. The difference of dissolution rates for this resist system toward 1.5 wt% aqueous tetramethylammonium hydroxide (TMAH) solution reached 1300-5000 times before and after UV radiation (200 mJ cm<sup>â 2</sup>). Thus, the photoresists containing 25 wt% of DNQs showed high sensitivities of 30-37 mJ cm<sup>â 2</sup> (D) and contrasts of 2.5-2.8 (γ) when they were exposed to 365 nm light and post-exposure baked (PEB) at 100â °C for 90 s, followed by developing with 1.5 wt% aqueous tetramethylammonium hydroxide (TMAH) solution at room temperature. A fine positive image featuring 1 µm of minimum line and space patterns was also printed on the film which was exposed to 40 mJ cm<sup>â 2 </sup>by the contact mode. |
| Формат | application.pdf |
| Издатель | Royal Society of Chemistry |
| Название | A new positive-type photoresist based on mono-substituted hydroquinone calix[8]arene and diazonaphthoquinone |
| Тип | research-article |
| DOI | 10.1039/a807718e |
| Electronic ISSN | 1364-5501 |
| Print ISSN | 0959-9428 |
| Журнал | Journal of Materials Chemistry |
| Том | 9 |
| Первая страница | 697 |
| Последняя страница | 702 |
| Выпуск | 3 |
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