| Автор | J A N Filipe |
| Автор | G J Rodgers |
| Автор | Z Tavassoli |
| Дата выпуска | 1998-09-18 |
| dc.description | Recently we introduced a one-dimensional accelerated random sequential adsorption process as a model for chemisorption with precursor layer diffusion. In this paper we consider this deposition process on disordered or impure substrates. The problem is solved exactly on both the lattice and continuum and for various impurity distributions. The results are compared with those from the standard random sequential adsorption model. |
| Формат | application.pdf |
| Издатель | Institute of Physics Publishing |
| Название | Deposition on disordered substrates with precursor layer diffusion |
| Тип | paper |
| DOI | 10.1088/0305-4470/31/37/005 |
| Print ISSN | 0305-4470 |
| Журнал | Journal of Physics A: Mathematical and General |
| Том | 31 |
| Первая страница | 7417 |
| Последняя страница | 7427 |
| Выпуск | 37 |
