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Автор Nadège Frantz-Rodriguez
Автор Alain Bosseboeuf
Автор Elisabeth Dufour-Gergam
Автор Valérie Stambouli-Séné
Автор Gérard Nouet
Автор Wilfrid Seiler
Автор Jean-Lou Lebrun
Дата выпуска 2000-06-01
dc.description Preliminary results on NiTiCu shape memory alloy thin-film deposition on silicon are reported. Characteristics of these films (composition, density and electrical resistivity) were correlated with working gas pressure and rf power during sputtering. The films were then annealed in order to crystallize them. The properties of these films were examined as functions of annealing and measurement temperatures in order to evidence shape memory behaviour.
Формат application.pdf
Издатель Institute of Physics Publishing
Название Composition and structure of NiTiCu shape memory thin films
Тип paper
DOI 10.1088/0960-1317/10/2/308
Electronic ISSN 1361-6439
Print ISSN 0960-1317
Журнал Journal of Micromechanics and Microengineering
Том 10
Первая страница 147
Последняя страница 151
Выпуск 2

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