| Автор | Gerold Schröpfer |
| Автор | Michel de Labachelerie |
| Автор | Sylvain Ballandras |
| Автор | Pascal Blind |
| Дата выпуска | 1998-06-01 |
| dc.description | We present a simple two-step etching process based on anisotropic wet etching of (100) silicon. As one example a system of three seismic masses on one chip has been fabricated. All three masses are symmetrically suspended by four high aspect ratio beams. The highly symmetrical design minimizes mechanical cross-sensitivities. Moreover, the three devices exhibit almost perfect rectangular alignment due to the orientation along the directions of the silicon crystal. Besides experimental results, design rules for the photolithography-masks are presented. |
| Формат | application.pdf |
| Издатель | Institute of Physics Publishing |
| Название | Collective wet etching of a 3D monolithic silicon seismic mass system |
| Тип | paper |
| DOI | 10.1088/0960-1317/8/2/008 |
| Electronic ISSN | 1361-6439 |
| Print ISSN | 0960-1317 |
| Журнал | Journal of Micromechanics and Microengineering |
| Том | 8 |
| Первая страница | 77 |
| Последняя страница | 79 |
| Выпуск | 2 |
