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Автор J T Wimmers
Автор J E Christopher
Дата выпуска 1981-02-28
dc.description Schottky barrier tunnel junctions were prepared by cleaving degenerately doped silicon in a stream of evaporating indium. For heavily doped samples the bias dependence of the incremental resistance at helium temperatures showed agreement with many features of the theoretical predictions for a free electron model. For these samples striations, regular doping density variations reportedly present in all silicon crystals, played a minimal role. For lowly doped samples disagreement between theory and experiment was observed. The inapplicability to lowly doped silicon of the simple theory and the effect of striations are both interpreted to contribute to the deviations. Striations are essential for understanding the radiation compensations results; behaviour in a single junction appropriate to a parallel combination of junctions with different doping density was observed. For strongly compensated material the zero-bias conductance exhibited an exp(-C/T<sup>1</sup>4/) behaviour characteristic of tunnelling via localised states.
Формат application.pdf
Издатель Institute of Physics Publishing
Название Tunnelling in metal-silicon Schottky barriers and effects of radiation compensation
Тип paper
DOI 10.1088/0022-3719/14/6/021
Print ISSN 0022-3719
Журнал Journal of Physics C: Solid State Physics
Том 14
Первая страница 977
Последняя страница 992
Аффилиация J T Wimmers; Dept. of Phys. Astron., Univ. of Kentucky, Lexington, KY, USA
Аффилиация J E Christopher; Dept. of Phys. Astron., Univ. of Kentucky, Lexington, KY, USA
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