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Автор B B Touami
Автор D V Osborne
Дата выпуска 1982-11-30
dc.description Phonon scattering in phosphorus-doped silicon has been studied using a heat-pulse technique in which backscattering is measured. With crystal sizes of the order of 10 mm and with phosphorus concentrations up to 1.8*10<sup>16</sup> cm<sup>-3</sup>, it has been shown that single-phonon scattering is predominant. A theoretical curve has been fitted to measurements of backscattered pulse amplitude as a function of input pulse power, and from this fit the authors have been able to deduce the constant A for isotopic Rayleigh scattering in pure silicon (A=0.43 s<sup>-1</sup> K<sup>-4</sup>), the deformation potential E<sub>u</sub> associated with the bottom of the conduction band (E<sub>u</sub>=8.6 eV), and the Bohr radius r<sub>0</sub> of the phosphorus impurity (r<sub>0</sub>=16 AA). These results are in agreement with those derived by other workers from thermal conductivity measurements.
Формат application.pdf
Издатель Institute of Physics Publishing
Название Phonon scattering in phosphorus-doped silicon
Тип paper
DOI 10.1088/0022-3719/15/33/010
Print ISSN 0022-3719
Журнал Journal of Physics C: Solid State Physics
Том 15
Первая страница 6719
Последняя страница 6729
Аффилиация B B Touami; School of Math. & Phys., Univ. of East Anglia, Norwich, UK
Аффилиация D V Osborne; School of Math. & Phys., Univ. of East Anglia, Norwich, UK
Выпуск 33

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