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Автор I Sauers
Автор T J Havens
Автор L G Christophorou
Дата выпуска 1980-07-14
dc.description Decomposition products from sparked 2-C<sub>4</sub>F<sub>6</sub>(2-perfluorobutyne)-SF<sub>6</sub> mixtures have been identified. These include the perfluorocarbons, CF<sub>4</sub>, C<sub>2</sub>F<sub>4</sub>, C<sub>2</sub>F<sub>6</sub>, C<sub>3</sub>F<sub>8</sub>, C<sub>4</sub>F<sub>8</sub>, C<sub>4</sub>F<sub>10</sub>, C<sub>5</sub>F<sub>12</sub> and C<sub>6</sub>F<sub>14</sub> and two isomers of S<sub>2</sub>C<sub>2</sub>F<sub>4</sub>. Saturated perfluorocarbon products are shown to increase in abundance with increasing concentration of SF<sub>6</sub> in 2-C<sub>4</sub>F<sub>6</sub> up to approximately 70% SF<sub>6</sub> in 2-C<sub>4</sub>F<sub>6</sub>. The most abundant decomposition product, perfluoromethane (CF<sub>4</sub>), was measured quantitatively for varying concentrations of SF<sub>6</sub> in 2-C<sub>4</sub>F<sub>6</sub> and found to show a maximum for the (70%) SF<sub>6</sub>-(30%)2-C<sub>4</sub>F<sub>6</sub> composition. The data suggest that the suppression of solid carbon deposits is effected by conversion of carbon to gaseous products (mostly saturated perfluorocarbons). Comparisons are made with sparked 2-C<sub>4</sub>F<sub>6</sub>-N<sub>2</sub> mixtures which show no evidence of carbon inhibition. These results indicate that proper tailoring of SF<sub>6</sub>-perfluorocarbon mixtures can effectively inhibit carbon formation.
Формат application.pdf
Издатель Institute of Physics Publishing
Название Carbon inhibition in sparked perfluorocarbon-SF<sub>6</sub> mixtures
Тип paper
DOI 10.1088/0022-3727/13/7/023
Electronic ISSN 1361-6463
Print ISSN 0022-3727
Журнал Journal of Physics D: Applied Physics
Том 13
Первая страница 1283
Последняя страница 1290
Аффилиация I Sauers; Atomic Molecular & High Voltage Phys. Group, Oak Ridge Nat. Lab., Oak Ridge, TN, USA
Аффилиация T J Havens; Atomic Molecular & High Voltage Phys. Group, Oak Ridge Nat. Lab., Oak Ridge, TN, USA
Аффилиация L G Christophorou; Atomic Molecular & High Voltage Phys. Group, Oak Ridge Nat. Lab., Oak Ridge, TN, USA
Выпуск 7

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