Influence of DC electric field on sheet resistance of thin tin and chromium films
M A Angadi; L A Udachan; M A Angadi; Dept. of Phys., Karnatak Univ., Dharwad, India; L A Udachan; Dept. of Phys., Karnatak Univ., Dharwad, India
Журнал:
Journal of Physics D: Applied Physics
Дата:
1981-05-14
Аннотация:
Reports on the effect of DC electric field on the sheet resistance of thin tin and chromium films in the thickness ranges 200 to 800 AA and 50 to 500 AA respectively. The sheet resistance increases in chromium films and decreases in tin films, with the increase in DC electric field during film growth.
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