Contacts of very low resistivity to YBaCuO thin films
L R Tessler; U Dai; N Hess; G Deutscher; L R Tessler; Dept. of Phys. & Astron., Raymond & Beverly Sackler Fac. of Exact Sci., Tel Aviv Univ., Ramat Aviv, Israel; U Dai; Dept. of Phys. & Astron., Raymond & Beverly Sackler Fac. of Exact Sci., Tel Aviv Univ., Ramat Aviv, Israel; N Hess; Dept. of Phys. & Astron., Raymond & Beverly Sackler Fac. of Exact Sci., Tel Aviv Univ., Ramat Aviv, Israel; G Deutscher; Dept. of Phys. & Astron., Raymond & Beverly Sackler Fac. of Exact Sci., Tel Aviv Univ., Ramat Aviv, Israel
Журнал:
Journal of Physics D: Applied Physics
Дата:
1988-11-14
Аннотация:
The authors report a method for the preparation of contacts of very low surface resistivity (contact resistance multiplied by contact area) to polycrystalline YBaCuO thin films. The method provides contacts with resistivities smaller than 3*10<sup>-7</sup> Omega cm<sup>2</sup>, which are obtained by the application of silver paint dots onto the film surface prior to annealing. Only one annealing procedure is required for the preparation of samples and contacts. Above the critical current both the four-terminal and two-terminal resistances obeyed Ohm's law for several current decades.
317.2Кб