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Автор J H Schön
Дата выпуска 2000-02-07
dc.description Technological applications of semiconductors depend critically on the ability to dope them. Single crystals of CuGaSe<sub>2</sub> were doped during crystal growth either by a post-growth diffusion step or by ion-implantation, in order to study the limits of extrinsic doping. The electrical and optical properties of the doped samples are analysed by Hall effect and photoluminescence (PL) measurements. The carrier concentration at room temperature can be adjusted between 2 × 10<sup>19</sup> cm<sup>-3</sup> (p-type) and 10<sup>17</sup> cm<sup>-3</sup> (n-type). Various donor and acceptor levels are identified and ascribed to dopant-induced point defects taking into account the dopant concentration and/or the post-growth treatment of the single crystals.
Формат application.pdf
Издатель Institute of Physics Publishing
Название Extrinsic doping of CuGaSe<sub>2</sub> single crystals
Тип paper
DOI 10.1088/0022-3727/33/3/316
Electronic ISSN 1361-6463
Print ISSN 0022-3727
Журнал Journal of Physics D: Applied Physics
Том 33
Первая страница 286
Последняя страница 291
Аффилиация J H Schön; Universität Konstanz, Fakultät für Physik, PO Box X916, D-78457 Konstanz, Germany
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