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Автор C St L Rhodes
Автор C A T Salama
Дата выпуска 1973-10-08
dc.description The transient recovery of the high-frequency capacitance of a deeply depleted MOS capacitor initially biased in the inversion region is analysed using a generation-recombination model which assumes a dominant discrete trap in the bulk and a uniform density of traps distributed in energy at the surface. This model enables the semi-conductor to be characterized in terms of its minority carrier recombination lifetime in the neutral bulk, its dominant bulk trap energy and its surface recombination velocity at flat-band conditions, all of which are time-independent parameters. The analysis is then used to extract these parameters from capacitance against time recovery curves measured on experimental silicon MOS structures. The difficulties associated with the deep depletion method of measuring lifetime and surface recombination velocity are pointed out, and a new technique involving the effect of optical injection on the MOS deep depletion recovery is described and used to determine the bulk lifetime independently of surface effects.
Формат application.pdf
Издатель Institute of Physics Publishing
Название Determination of the lifetime from thermal generation and optical injection in a pulsed MOS capacitor
Тип paper
DOI 10.1088/0022-3727/6/15/307
Electronic ISSN 1361-6463
Print ISSN 0022-3727
Журнал Journal of Physics D: Applied Physics
Том 6
Первая страница 1798
Последняя страница 1815
Аффилиация C St L Rhodes; Department of Electrical Engineering, University of Toronto, Toronto, M5S 1A4, Ontario, Canada
Аффилиация C A T Salama; Department of Electrical Engineering, University of Toronto, Toronto, M5S 1A4, Ontario, Canada
Выпуск 15

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