The construction of a water-cooled housing for highly stabilised evaporation sources used in UHV for preparation of ultrathin metal films is described. Five different sources, which can be rotated one-by-one into position, give a perpendicular beam flux relative to the substrate surface. The design and performance of two highly stabilised metal evaporation sources with crucibles of graphite and boron nitride respectively are described. The temperature stability and decomposition of the graphite-type source are presented and discussed in detail. Furthermore the construction and experimental details are given for a high-purity carbon evaporation source exploiting the electron bombardment technique.