Автор |
R A L Drew |
Автор |
W M Williams |
Автор |
W B Muir |
Дата выпуска |
1985-01-01 |
dc.description |
The electrical resistivity rho of a metal can be expressed as rho = rho <sub>I</sub>+ rho <sub>T</sub>+ rho <sub>CW</sub>+ rho <sub>GB</sub> where rho <sub>I</sub> and rho <sub>T</sub> are the components of the resistivity due to impurities and lattice vibrations respectively. rho <sub>CW</sub> is the component of the resistivity due to cold work while rho <sub>GB</sub> is that due to grain boundaries. Both rho <sub>CW</sub> and rho <sub>GB</sub> will change on annealing. rho <sub>CW</sub> will be reduced as the imperfections anneal and rho <sub>GB</sub> will decrease with grain growth. Unfortunately these effects are usually masked by changes in rho <sub>T</sub> except under high stability isothermal annealing conditions. The technique described represents a novel method of suppressing rho <sub>T</sub> and allows direct measurement of rho <sub>CW</sub>+ rho <sub>GB</sub>. This makes possible the in situ monitoring of industrial annealing processes. |
Формат |
application.pdf |
Издатель |
Institute of Physics Publishing |
Название |
Differential resistivity for annealing studies |
Тип |
paper |
DOI |
10.1088/0022-3735/18/1/010 |
Print ISSN |
0022-3735 |
Журнал |
Journal of Physics E: Scientific Instruments |
Том |
18 |
Первая страница |
30 |
Последняя страница |
31 |
Аффилиация |
R A L Drew; Dept. of Metall. Eng., McGill Univ., Montreal, Que., Canada |
Аффилиация |
W M Williams; Dept. of Metall. Eng., McGill Univ., Montreal, Que., Canada |
Аффилиация |
W B Muir; Dept. of Metall. Eng., McGill Univ., Montreal, Que., Canada |
Выпуск |
1 |