| Автор | M Oron |
| Автор | C M Adams Jr |
| Дата выпуска | 1969-02-01 |
| dc.description | A process of controlled electron beam co-deposition of binary alloy films was developed and tested. The electron beam is oscillated in a controlled manner between two vapour sources dwelling on each for a predetermined time. Film composition can be controlled by varying the dwelling times ratio. Geometry of deposition was designed to produce films of uniform thickness and composition. Applicability of the method to various material systems has been determined. |
| Формат | application.pdf |
| Издатель | Institute of Physics Publishing |
| Название | Apparatus for controlled electron beam co-deposition of alloy films |
| Тип | paper |
| DOI | 10.1088/0022-3735/2/2/315 |
| Print ISSN | 0022-3735 |
| Журнал | Journal of Physics E: Scientific Instruments |
| Том | 2 |
| Первая страница | 183 |
| Последняя страница | 186 |
| Выпуск | 2 |
