Мобильная версия

Доступно журналов:

3 288

Доступно статей:

3 891 637

 

Скрыть метаданые

Автор L Pavesi
Автор M Henini
Автор D Johnston
Автор I Harrison
Дата выпуска 1995-01-01
dc.description Hall and photoluminescence measurements of Si-doped Al<sub>0.3</sub>Ga<sub>0.7</sub>As samples grown by molecular beam epitaxy on high index surfaces are reported. These data are compared with structures grown on the conventional (100) orientation. All the samples measured in this work have been grown under identical conditions. For (100), (111)B and (311)B Al<sub>x</sub>Ga<sub>1-x</sub>As we found an n-type doping while for (111)A Al<sub>x</sub>Ga<sub>1-x</sub>As the doping was p-type. The growth parameters used are the optimum ones for (100) Al<sub>x</sub>Ga<sub>1-x</sub>As. Growth under these conditions does not produce high quality (111)A or (111)B Al<sub>x</sub>Ga<sub>1-x</sub>As. However, the (311)B Al<sub>x</sub>Ga<sub>1-x</sub>As samples show comparable characteristics to (100) Al<sub>x</sub>Ga<sub>1-x</sub>As samples.
Формат application.pdf
Издатель Institute of Physics Publishing
Название A comparison of Si-doped (100), (111) A, (111) B and (311) B Al<sub>x</sub>Ga<sub>1-x</sub>As samples grown by molecular beam epitaxy
Тип paper
DOI 10.1088/0268-1242/10/1/008
Electronic ISSN 1361-6641
Print ISSN 0268-1242
Журнал Semiconductor Science and Technology
Том 10
Первая страница 49
Последняя страница 55
Аффилиация L Pavesi; Dipartimento di Fisica, Trento Univ., Italy
Аффилиация M Henini; Dipartimento di Fisica, Trento Univ., Italy
Аффилиация D Johnston; Dipartimento di Fisica, Trento Univ., Italy
Аффилиация I Harrison; Dipartimento di Fisica, Trento Univ., Italy
Выпуск 1

Скрыть метаданые