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Автор C A Verschuren
Автор P J Harmsma
Автор Y S Oei
Автор M R Leys
Автор H Vonk
Автор J H Wolter
Дата выпуска 1998-08-01
dc.description The lateral coupling of waveguiding structures in both and directions is studied using embedded selective area epitaxy by chemical beam epitaxy. All growth steps are carried out under the same growth conditions on InP substrates misoriented by towards . Both planar and selectively grown material exhibits bright luminescence and narrow PL linewidths (8 meV FWHM at 4 K), up to the lateral junction. Moreover, no degradation of the original material properties is observed after regrowth. SEM images show very flat layers and excellent lateral coupling for all four types of junctions. After reactive ion etching of waveguide ridges, the optical coupling losses have been determined using a Fabry-Pérot setup at 1530 nm (TE polarization). Values of 0.1 dB/interface with excellent uniformity are presented. From our results we conclude that, by optimization of the sample preparation prior to regrowth, values of 0.1 dB/interface can be obtained reproducibly for both perpendicular coupling directions.
Формат application.pdf
Издатель Institute of Physics Publishing
Название Butt-coupling loss of 0.1 dB/interface in InP/InGaAs multiple-quantum-well waveguide-waveguide structures grown by selective area chemical beam epitaxy
Тип paper
DOI 10.1088/0268-1242/13/8A/048
Electronic ISSN 1361-6641
Print ISSN 0268-1242
Журнал Semiconductor Science and Technology
Том 13
Первая страница A169
Последняя страница A172
Выпуск 8A

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