Мобильная версия

Доступно журналов:

3 288

Доступно статей:

3 891 637

 

Скрыть метаданые

Автор G J Papaioannou
Автор V Ioannou-Sougleridis
Автор T Lalinski
Автор J Kuzmik
Автор M Porges
Автор C D Kourkoutas
Дата выпуска 1992-07-01
dc.description The PHOTOFET method is applied to submicrometre MESFETS processed on ion-implanted Cr-doped substrates. It is demonstrated that the magnitude of the photoconductivity both under extrinsic and intrinsic illumination is determined by the substrate leakage current, which is a function of the device drain bias. A semiempirical modeling of the dependence of the photoconductivity on the device bias gives a power-law relation between the leakage current and the drain bias.
Формат application.pdf
Издатель Institute of Physics Publishing
Название The PHOTOFET method in submicrometre GaAs MESFETS: substrate leakage current effect
Тип paper
DOI 10.1088/0268-1242/7/7/011
Electronic ISSN 1361-6641
Print ISSN 0268-1242
Журнал Semiconductor Science and Technology
Том 7
Первая страница 935
Последняя страница 939
Аффилиация G J Papaioannou; Dept. of Phys., Athens Univ., Zographos, Greece
Аффилиация V Ioannou-Sougleridis; Dept. of Phys., Athens Univ., Zographos, Greece
Аффилиация T Lalinski; Dept. of Phys., Athens Univ., Zographos, Greece
Аффилиация J Kuzmik; Dept. of Phys., Athens Univ., Zographos, Greece
Аффилиация M Porges; Dept. of Phys., Athens Univ., Zographos, Greece
Аффилиация C D Kourkoutas; Dept. of Phys., Athens Univ., Zographos, Greece
Выпуск 7

Скрыть метаданые