| Автор | H Schilling |
| Автор | M Camani |
| Автор | F N Gygax |
| Автор | W Ruegg |
| Автор | A Schenck |
| Дата выпуска | 1982-05-01 |
| dc.description | The behaviour of positive muons ( mu <sup>+</sup>) has been studied in Cu, V, Nb and Ta single crystals, using the muon spin rotation ( mu SR) technique. The measurements were performed in the temperature regime 5-365K, in transverse external magnetic fields of 50-5500 G. In FCC Cu the mu <sup>+</sup> diffusional motion can be described in terms of quantum mechanical jump processes of a small polaron among octahedral interstitial sites. An orientation average leads to an activation energy of E=79.2+or-3.1 meV, a pre-exponential factor of D(0)=(1.66+or-0.33)*10<sup>-8</sup> cm<sup>2</sup> s<sup>-1</sup> and a tunnelling matrix element of J=(18.3+or-1.8)*10<sup>-6</sup> eV. The mu <sup>+</sup> total volume expansion was found to be Delta V=3.91 AA<sup>3</sup>. Furthermore, the electric field gradient (EFG) at the mu <sup>+</sup> nearest-neighbour nuclei has been determined as q=0.30 AA<sup>-3</sup>. In BCC V, Nb and Ta the mu <sup>+</sup> diffusion is trap-limited. As a function of the temperature the mu <sup>+</sup> probe different classes of trapping sites associated with host metal impurities. At low temperature, before decaying, the mu <sup>+</sup> always end up in a trapped state which shows that the intrinsic mu <sup>+</sup> motion between traps is fast and seems to reflect properties of a band diffusion. |
| Формат | application.pdf |
| Издатель | Institute of Physics Publishing |
| Название | Depolarisation studies of positive muons in copper, vanadium, niobium and tantalum single crystals |
| Тип | paper |
| DOI | 10.1088/0305-4608/12/5/007 |
| Print ISSN | 0305-4608 |
| Журнал | Journal of Physics F: Metal Physics |
| Том | 12 |
| Первая страница | 875 |
| Последняя страница | 893 |
| Аффилиация | H Schilling; Lab. for High Energy Phys., Swiss Federal Inst. of Technol., Villigen, Switzerland |
| Аффилиация | M Camani; Lab. for High Energy Phys., Swiss Federal Inst. of Technol., Villigen, Switzerland |
| Аффилиация | F N Gygax; Lab. for High Energy Phys., Swiss Federal Inst. of Technol., Villigen, Switzerland |
| Аффилиация | W Ruegg; Lab. for High Energy Phys., Swiss Federal Inst. of Technol., Villigen, Switzerland |
| Аффилиация | A Schenck; Lab. for High Energy Phys., Swiss Federal Inst. of Technol., Villigen, Switzerland |
| Выпуск | 5 |
