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Автор H Sato
Автор F J G Roesthuis
Автор A H Sonnenberg
Автор A J H M Rijnders
Автор H Rogalla
Автор D H A Blank
Дата выпуска 2000-05-01
dc.description We studied the morphology of ramps in YBa<sub>2</sub>Cu<sub>3</sub>O<sub>7-δ</sub> films and, subsequently, the barrier layer. The ramps have been fabricated by Ar ion beam milling using standard photoresist masks. SEM and AFM showed the formation of tracks along the slope of the ramp, originating from the irregular shape of the edge of the photoresist mask. A proposed modified reflowed resist and pre-annealing process show a significantly smoother ramp surface, important for the fabrication of reproducible Josephson junctions.
Формат application.pdf
Издатель Institute of Physics Publishing
Название Investigation of the microstructure of ramp-type YBa<sub>2</sub>Cu<sub>3</sub>O<sub>7-δ</sub> structures
Тип paper
DOI 10.1088/0953-2048/13/5/319
Electronic ISSN 1361-6668
Print ISSN 0953-2048
Журнал Superconductor Science and Technology
Том 13
Первая страница 522
Последняя страница 526
Аффилиация H Sato; Low Temperature Division and MESA<sup>+</sup> Research Institute, University of Twente, PO Box 217, 7500 AE, Enschede, The Netherlands
Аффилиация F J G Roesthuis; Low Temperature Division and MESA<sup>+</sup> Research Institute, University of Twente, PO Box 217, 7500 AE, Enschede, The Netherlands
Аффилиация A H Sonnenberg; Low Temperature Division and MESA<sup>+</sup> Research Institute, University of Twente, PO Box 217, 7500 AE, Enschede, The Netherlands
Аффилиация A J H M Rijnders; Low Temperature Division and MESA<sup>+</sup> Research Institute, University of Twente, PO Box 217, 7500 AE, Enschede, The Netherlands
Аффилиация H Rogalla; Low Temperature Division and MESA<sup>+</sup> Research Institute, University of Twente, PO Box 217, 7500 AE, Enschede, The Netherlands
Аффилиация D H A Blank; Low Temperature Division and MESA<sup>+</sup> Research Institute, University of Twente, PO Box 217, 7500 AE, Enschede, The Netherlands
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