A new approach for the preparation of in situ superconducting BSCCO films
A Agarwal; R P Gupta; W S Khokle; K D Kundra; P R Deshmukh; M Singh; P D Vyas; A Agarwal; Central Electron. Eng. Res. Inst., Pilani, India; R P Gupta; Central Electron. Eng. Res. Inst., Pilani, India; W S Khokle; Central Electron. Eng. Res. Inst., Pilani, India; K D Kundra; Central Electron. Eng. Res. Inst., Pilani, India; P R Deshmukh; Central Electron. Eng. Res. Inst., Pilani, India; M Singh; Central Electron. Eng. Res. Inst., Pilani, India; P D Vyas; Central Electron. Eng. Res. Inst., Pilani, India
Журнал:
Superconductor Science and Technology
Дата:
1993-09-01
Аннотация:
The paper reports a new approach, based on low-pressure on-axis sputter deposition followed by high-pressure plasma treatment (OPT) for the preparation of in situ superconducting Bi-Sr-Ca-Cu-O (BSCCO) films with a high-T<sub>c</sub> phase. It was observed that OPT is essential to lower the room-temperature resistance and to achieve superconduction in the films.
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