| Автор | G Salomonsen |
| Автор | N Norman |
| Автор | O Lonsjo |
| Автор | T G Finstad |
| Дата выпуска | 1989-10-23 |
| dc.description | Oxidation kinetics of thin films of Cr in the temperature range 490-630 degrees C have been studied using backscattering spectrometry and X-ray diffraction. In the studied region the growth of the oxide Cr<sub>2</sub>O<sub>3</sub> has been found to obey a parabolic growth-rate law with an activation energy of 1.2 eV. Implanted Xe markers show that the growth of the oxide occurs almost entirely at the surface and is controlled by the motion of Cr species in the oxide. |
| Формат | application.pdf |
| Издатель | Institute of Physics Publishing |
| Название | Kinetics and mechanism of oxide formation on Cr thin films |
| Тип | paper |
| DOI | 10.1088/0953-8984/1/42/006 |
| Electronic ISSN | 1361-648X |
| Print ISSN | 0953-8984 |
| Журнал | Journal of Physics: Condensed Matter |
| Том | 1 |
| Первая страница | 7843 |
| Последняя страница | 7850 |
| Аффилиация | G Salomonsen; Inst. of Phys., Oslo Univ., Norway |
| Аффилиация | N Norman; Inst. of Phys., Oslo Univ., Norway |
| Аффилиация | O Lonsjo; Inst. of Phys., Oslo Univ., Norway |
| Аффилиация | T G Finstad; Inst. of Phys., Oslo Univ., Norway |
| Выпуск | 42 |
