| Автор | R S Eachus |
| Автор | Th D Pawlik |
| Автор | R C Baetzold |
| Дата выпуска | 2000-10-16 |
| dc.description | By using a combination of multifrequency EPR spectroscopy, ENDOR spectroscopy and calculations of structure and energy, the reactivities of photo-generated holes in microcrystalline AgBr and AgCl dispersions (photographic emulsions) have been followed in detail. Progress has been facilitated by the use of both gelatin and polyvinyl alcohol (PVA) as peptizers. The initial trapped hole centres produced by band-gap excitation have been identified. In AgBr, this species is [(Br<sub>4</sub>)<sup>3-</sup>·V], a neutral complex formed from hole trapping by the four nearest neighbours of a surface Ag<sup>+</sup> vacancy (=V). [(Br<sub>4</sub>)<sup>3-</sup>·V] reacts with gelatin to produce a transient organic radical at the grain's surface. It does not, however, react with PVA. The formation of the oxidized gelatin radical might involve atomic bromine as an intermediate. In AgCl, the well-known self-trapped hole centre (AgCl<sub>6</sub>)<sup>4-</sup> is the initial hole species. The hole diffuses by an electron exchange process until it is trapped by a silver ion on the grain's surface or within its penultimate layer of lattice ions. It is subsequently released from this Ag<sup>2+</sup> site to be retrapped at a centre containing four equivalent Cl<sup>-</sup> ions. The precise identity of this defect has yet to be determined, but its decay also results in the oxidation of gelatin. |
| Формат | application.pdf |
| Издатель | Institute of Physics Publishing |
| Название | Multifrequency electron paramagnetic resonance and electron-nuclear double-resonance studies of photo-hole processes in AgBr and AgCl emulsion grains |
| Тип | paper |
| DOI | 10.1088/0953-8984/12/41/316 |
| Electronic ISSN | 1361-648X |
| Print ISSN | 0953-8984 |
| Журнал | Journal of Physics: Condensed Matter |
| Том | 12 |
| Первая страница | 8893 |
| Последняя страница | 8911 |
| Аффилиация | R S Eachus; Imaging Materials Division, Research and Development, Eastman Kodak Company, Rochester, NY 14650-2021, USA |
| Аффилиация | Th D Pawlik; Imaging Materials Division, Research and Development, Eastman Kodak Company, Rochester, NY 14650-2021, USA |
| Аффилиация | R C Baetzold; Imaging Materials Division, Research and Development, Eastman Kodak Company, Rochester, NY 14650-2021, USA |
| Выпуск | 41 |
