Автор |
T M Schmidt |
Автор |
J F Justo |
Автор |
A Fazzio |
Дата выпуска |
2000-12-11 |
dc.description |
We performed a theoretical investigation on the effects of extended defects on the structural and electronic properties of dopant atoms in gallium arsenide. We observed that silicon impurities segregate at GaAs stacking faults. A Si atom at a Ga site in a stacking fault in either a neutral or a negatively charged state is energetically favourable as compared to a Si atom at a Ga site in a crystalline environment by as much as 0.2 eV. Additionally, a substitutional Si impurity in the negative charge state in a stacking fault has a distinct structure as compared to the same impurity in a crystal. The results suggest that the stacking fault may prevent the formation of metastable defects, such as DX centres. |
Формат |
application.pdf |
Издатель |
Institute of Physics Publishing |
Название |
The effect of a stacking fault on the electronic properties of dopants in gallium arsenide |
Тип |
paper |
DOI |
10.1088/0953-8984/12/49/323 |
Electronic ISSN |
1361-648X |
Print ISSN |
0953-8984 |
Журнал |
Journal of Physics: Condensed Matter |
Том |
12 |
Первая страница |
10235 |
Последняя страница |
10239 |
Выпуск |
49 |