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Автор M A Chesters
Автор A B Horn
Дата выпуска 1991-11-01
dc.description The authors report here low-energy electron diffraction (LEED), Auger electron (AES) and reflection-absorption infrared spectroscopic (RAIRS) studies of the adsorption of disilane (Si<sub>2</sub>H<sub>6</sub>) on the hexagonal Ru(0001) surface at room temperature. Initial steps show the formation of an adsorbed SiH fragment which is easily decomposed to leave elemental silicon at 450 K. The room temperature LEED patterns show a coverage dependence, with a transition from a (2*2) pattern at low coverage to a mixed (2*2) and (1.5*1.5) pattern towards saturation. Annealing of the saturated surface to 800 K results in the formation of an ordered overlayer with a (3*3) R18 LEED pattern which, in combination with AES data, is assigned to an incommensurate layer of ruthenium silicide.
Формат application.pdf
Издатель Institute of Physics Publishing
Название The deposition of silicon on metal single-crystal surfaces, studied by RAIRS, LEED and AES
Тип paper
DOI 10.1088/0953-8984/3/S/039
Electronic ISSN 1361-648X
Print ISSN 0953-8984
Журнал Journal of Physics: Condensed Matter
Том 3
Первая страница S251
Последняя страница S256
Аффилиация M A Chesters; Sch. of Chem. Sci., East Anglia Univ., Norwich, UK
Аффилиация A B Horn; Sch. of Chem. Sci., East Anglia Univ., Norwich, UK
Выпуск S

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