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Автор D R Mace
Автор M P Grimshaw
Автор D A Ritchie
Автор C J B Ford
Автор M Pepper
Автор G A C Jones
Дата выпуска 1993-04-19
dc.description Sub-micron split-gate structures have been fabricated on three pseudomorphic GaAs-In<sub>x</sub>Ga<sub>1-x</sub>As-AlGaAs quantum well structures, with indium fraction, x of 0.04, 0.10, and 0.14. The conductance characteristic of the device on the x=0.04 material showed clear plateaux due to the quantization of ballistic conduction in one dimension. Devices fabricated from the x=0.10 and x=0.14 material did not show plateaux, but exhibited a complex structure that varied quantitatively between nominally identical devices. This structure is thought to be due to both the random nature of the In<sub>x</sub>Ga<sub>1-x</sub>As alloy, and the roughness of the In<sub>x</sub>Ga<sub>1-x</sub>As interfaces. The spatial variation of the potential between the arms of the split gate due to these effects was probed by applying a differential voltage between the two gates.
Формат application.pdf
Издатель Institute of Physics Publishing
Название Electron conduction characteristics of split-gate structures fabricated on pseudomorphic GaAs-In<sub>x</sub>Ga<sub>1-x</sub>As-AlGaAs heterostructures
Тип lett
DOI 10.1088/0953-8984/5/16/002
Electronic ISSN 1361-648X
Print ISSN 0953-8984
Журнал Journal of Physics: Condensed Matter
Том 5
Первая страница L227
Последняя страница L234
Аффилиация D R Mace; Cavendish Lab., Cambridge Univ., UK
Аффилиация M P Grimshaw; Cavendish Lab., Cambridge Univ., UK
Аффилиация D A Ritchie; Cavendish Lab., Cambridge Univ., UK
Аффилиация C J B Ford; Cavendish Lab., Cambridge Univ., UK
Аффилиация M Pepper; Cavendish Lab., Cambridge Univ., UK
Аффилиация G A C Jones; Cavendish Lab., Cambridge Univ., UK
Выпуск 16

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