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Автор I Jencic
Автор J Peternelj
Автор I M Robertson
Дата выпуска 1993-10-25
dc.description The formation of amorphous zones, induced by heavy-ion irradiation of III-V compounds and their ternary alloys, was studied using a computer simulation. For this purpose, the so-called sillium model, which has been used to model amorphous Si and Ge, was modified and subsequently employed in III-V compounds. The modification had to take into account different boundary conditions and different interatomic potentials in order to account for the partly ionic character of the bonds in these solids. For the Coulomb part of the potential we assumed rigid point ions with charges equal to the transversal effective charge. The results of the simulation show that the model is capable of producing a locally disordered structure surrounded by a perfect crystal lattice, provided that the energy of the initial displacement cascade is sufficiently high. It is also shown that the virtual crystal approximation is not adequate to confirm the experimentally observed differences in amorphization between GaAs and Al<sub>0.85</sub>Ga<sub>0.15</sub>As.
Формат application.pdf
Издатель Institute of Physics Publishing
Название A computer simulation of local amorphization in III-V compounds
Тип paper
DOI 10.1088/0953-8984/5/43/004
Electronic ISSN 1361-648X
Print ISSN 0953-8984
Журнал Journal of Physics: Condensed Matter
Том 5
Первая страница 7907
Последняя страница 7922
Аффилиация I Jencic; Inst. Jozef Stefan, Ljubljana, Slovenia
Аффилиация J Peternelj; Inst. Jozef Stefan, Ljubljana, Slovenia
Аффилиация I M Robertson; Inst. Jozef Stefan, Ljubljana, Slovenia
Выпуск 43

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