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Автор Y Shi
Автор F M Wu
Автор Y D Zheng
Автор M Suezawa
Автор M Imai
Автор K Sumino
Дата выпуска 1994-10-10
dc.description The optically active process of higher-order bands (HOBs) in fast-neutron-irradiated float-zone silicon has been investigated at low temperature using a Fourier-transform infrared spectrometer with optical excitation. It is found that the photoexcitation process follows an exponential time dependence and that the decay is logarithmic with a decay time constant of 10<sup>5</sup> s at 7 K. The saturation value of the absorption coefficients depends on the logarithm of the illumination-light intensity. These characteristics are associated with the slow relaxation of photoexcited carriers originating mainly from defect clusters. The relaxation behaviour of photoexcited carriers has been analysed using the macroscopic-barrier model, which is in good agreement with the observations.
Формат application.pdf
Издатель Institute of Physics Publishing
Название The optically active process of higher-order bands in neutron-irradiated silicon
Тип paper
DOI 10.1088/0953-8984/6/41/026
Electronic ISSN 1361-648X
Print ISSN 0953-8984
Журнал Journal of Physics: Condensed Matter
Том 6
Первая страница 8645
Последняя страница 8653
Аффилиация Y Shi; Dept. of Phys., Nanjing Univ., China
Аффилиация F M Wu; Dept. of Phys., Nanjing Univ., China
Аффилиация Y D Zheng; Dept. of Phys., Nanjing Univ., China
Аффилиация M Suezawa; Dept. of Phys., Nanjing Univ., China
Аффилиация M Imai; Dept. of Phys., Nanjing Univ., China
Аффилиация K Sumino; Dept. of Phys., Nanjing Univ., China
Выпуск 41

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