| Автор | N Igata |
| Дата выпуска | 1996-03-01 |
| dc.description | The properties of a surface are fundamentally controlled by the chemical composition of the nanoscale surface layer. Therefore nanoscale segregation at the surface is one of the most important problems in surface science and technology. The chemical analysis of the surface layer and the study of segregation have been developed by various methods, but mainly by AES and TOFAP since . Surface segregation under irradiation is also an urgent problem to be solved and the same methods have been applied. In this paper, the results from TOFAP for segregation both under thermal equilibrium and under irradiation are introduced. As for theoretical aspects, both thermal segregation and segregation under irradiation are interpreted by atomistic theory. |
| Формат | application.pdf |
| Издатель | Institute of Physics Publishing |
| Название | Nanoscale segregation at a metal surface |
| Тип | paper |
| DOI | 10.1088/0957-4484/7/1/003 |
| Electronic ISSN | 1361-6528 |
| Print ISSN | 0957-4484 |
| Журнал | Nanotechnology |
| Том | 7 |
| Первая страница | 21 |
| Последняя страница | 26 |
| Аффилиация | N Igata; Department of Materials Science and Technology, Science University of Tokyo, 2641 Yamazaki Noda City, Chiba Prefecture 278, Japan |
| Выпуск | 1 |
