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Автор O A Popov
Автор A O Westner
Дата выпуска 1994-11-01
dc.description Ion-beam-sputtered and -assisted deposition technologies need medium energy, 100-2000 eV, ion beams of current density 1-3 mA cm<sup>-2</sup>, operated in a reactive and corrosive gas environment. We designed, built and characterized a compact electron cyclotron resonance ion beam source generating 2 cm diameter ion beams with currents of 2-8 mA and energy 200-1700 eV. Continuous wave microwave power (2.45 GHz, P<sub>1</sub>=0-300 W) was introduced into a 5 cm diameter plasma chamber via a 50 omega cable and a half-wavelength antenna. A ceramic cup sealed the plasma chamber and separated the antenna from the plasma. Boron nitride spacers electrically isolated the high-voltage plasma from the earthed chamber walls. Two Sm-Co ring-shaped magnets formed a circular electron cyclotron resonance surface in the plasma generation zone near the microwave introduction point. An external magnetic coil generated in the chamber an axial magnetic field, which helped to ignite the plasma and to control the plasma shape and density. The ignition microwave power was 5-40 W, with operational (argon) pressures in the beam line of 2*10<sup>-5</sup> to 2*10<sup>-4</sup> Torr. An argon ion beam was extracted using two multi-aperture pyrolitic graphite grids: a positive plasma grid and a negative electron suppression grid. The ion beam current increased linearly with microwave power; the beam half-angle divergence near the target was alpha /2=4-6.
Формат application.pdf
Издатель Institute of Physics Publishing
Название A compact electron cyclotron resonance source for 200-2000 eV ion beams
Тип paper
DOI 10.1088/0963-0252/3/4/001
Electronic ISSN 1361-6595
Print ISSN 0963-0252
Журнал Plasma Sources Science and Technology
Том 3
Первая страница 453
Последняя страница 459
Аффилиация O A Popov; Microscience Inc., Norwell, MA, USA
Аффилиация A O Westner; Microscience Inc., Norwell, MA, USA
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