Автор |
O A Popov |
Автор |
A O Westner |
Дата выпуска |
1994-11-01 |
dc.description |
Ion-beam-sputtered and -assisted deposition technologies need medium energy, 100-2000 eV, ion beams of current density 1-3 mA cm<sup>-2</sup>, operated in a reactive and corrosive gas environment. We designed, built and characterized a compact electron cyclotron resonance ion beam source generating 2 cm diameter ion beams with currents of 2-8 mA and energy 200-1700 eV. Continuous wave microwave power (2.45 GHz, P<sub>1</sub>=0-300 W) was introduced into a 5 cm diameter plasma chamber via a 50 omega cable and a half-wavelength antenna. A ceramic cup sealed the plasma chamber and separated the antenna from the plasma. Boron nitride spacers electrically isolated the high-voltage plasma from the earthed chamber walls. Two Sm-Co ring-shaped magnets formed a circular electron cyclotron resonance surface in the plasma generation zone near the microwave introduction point. An external magnetic coil generated in the chamber an axial magnetic field, which helped to ignite the plasma and to control the plasma shape and density. The ignition microwave power was 5-40 W, with operational (argon) pressures in the beam line of 2*10<sup>-5</sup> to 2*10<sup>-4</sup> Torr. An argon ion beam was extracted using two multi-aperture pyrolitic graphite grids: a positive plasma grid and a negative electron suppression grid. The ion beam current increased linearly with microwave power; the beam half-angle divergence near the target was alpha /2=4-6. |
Формат |
application.pdf |
Издатель |
Institute of Physics Publishing |
Название |
A compact electron cyclotron resonance source for 200-2000 eV ion beams |
Тип |
paper |
DOI |
10.1088/0963-0252/3/4/001 |
Electronic ISSN |
1361-6595 |
Print ISSN |
0963-0252 |
Журнал |
Plasma Sources Science and Technology |
Том |
3 |
Первая страница |
453 |
Последняя страница |
459 |
Аффилиация |
O A Popov; Microscience Inc., Norwell, MA, USA |
Аффилиация |
A O Westner; Microscience Inc., Norwell, MA, USA |
Выпуск |
4 |