| Автор | Sivananda K Kanakasabapathy |
| Автор | Lawrence J Overzet |
| Дата выпуска | 1998-08-01 |
| dc.description | In this paper, a 1D numerical, time-dynamic, fluid model (SHEATHSIM) has been developed to study the effect of RF chuck bias on high density electronegative discharges especially under conditions of sheath inversion and negative ion extraction. In each sheath, ion momentum conservation and ion continuity equations, closed by Poisson's equation, are solved for a given set of bulk densities, temperatures and mean free path lengths of each ionic species. Two such sheaths are closed by a common bulk potential and current continuity. Qualitatively, high electronegativities , low electron temperatures , high asymmetries , DC coupling of bias power and low frequencies tend to favour sheath inversion and subsequent negative ion extraction. Quiescent floating sheath simulations show the self-consistent rise of the plasma regions and the Bohm criterion. Such modelling in conjunction with source antennae electromagnetics and chemical kinetics can lead to computer aided process and reactor design with a view to reducing charge-up damage through negative ion extraction. |
| Формат | application.pdf |
| Издатель | Institute of Physics Publishing |
| Название | A coupled two-sheath simulation of RF bias at high electronegativities |
| Тип | paper |
| DOI | 10.1088/0963-0252/7/3/007 |
| Electronic ISSN | 1361-6595 |
| Print ISSN | 0963-0252 |
| Журнал | Plasma Sources Science and Technology |
| Том | 7 |
| Первая страница | 289 |
| Последняя страница | 297 |
| Аффилиация | Sivananda K Kanakasabapathy; Plasma Applications Laboratory, Erik Jonsson School of Engineering and Computer Science, University of Texas at Dallas, PO Box 830688, EC 33, Richardson, TX 75080, USA |
| Аффилиация | Lawrence J Overzet; Plasma Applications Laboratory, Erik Jonsson School of Engineering and Computer Science, University of Texas at Dallas, PO Box 830688, EC 33, Richardson, TX 75080, USA |
| Выпуск | 3 |
