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Автор Hwei-Heng Wang
Автор Dei-Wei Chou
Автор Yeong-Her Wang
Автор Mau-Phon Houng
Дата выпуска 1999-01-01
dc.description The properties of GaAs oxides prepared by liquid phase chemical-enhanced oxidation (LPCEO) technique are investigated. The refractive indices of the oxide films appear to increase with oxidation time, and can be well controlled by the oxidation procedures. It has been found that the accumulation of As compounds within the oxides is the origin for the phenomena. Based on the current-voltage (I-V) characteristics of the metal-oxide-semiconductor (MOS) structures, the leakage current density of the oxide has been demonstrated to be low (∼ 2 × 10<sup>-8</sup> A/cm<sup>2</sup>), and a high dielectric breakdown strength of ∼ 8 MV/cm is achieved. Finally, the complete chemical compositions from the oxide surface to the oxide-substrate interface has been determined by x-ray photoelectron spectroscopy (XPS) and secondary ion mass spectroscopy (SIMS) depth profiles.
Формат application.pdf
Издатель Institute of Physics Publishing
Название Properties of GaAs oxides prepared by liquid phase chemical-enhanced technique
Тип paper
DOI 10.1238/Physica.Topical.079a00239
Electronic ISSN 1402-4896
Print ISSN 0031-8949
Журнал Physica Scripta
Том 1999
Первая страница 239
Последняя страница 242
Аффилиация Hwei-Heng Wang; Department of Electrical Engineering, National Cheng-Kung University, Tainan, Taiwan, ROC
Аффилиация Dei-Wei Chou; Department of Electrical Engineering, National Cheng-Kung University, Tainan, Taiwan, ROC
Аффилиация Yeong-Her Wang; Department of Electrical Engineering, National Cheng-Kung University, Tainan, Taiwan, ROC
Аффилиация Mau-Phon Houng; Department of Electrical Engineering, National Cheng-Kung University, Tainan, Taiwan, ROC
Выпуск T79

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