Investigation on plasma-quenching efficiency of various gases using the inductively coupled thermal plasma technique: effect of various gas injection on Ar thermal ICP
Y Tanaka; T Sakuta; Y Tanaka; Department of Electrical and Electronic Engineering, Kanazawa University, 2-40-20 Kodatsuno, Kanazawa, Ishikawa 920-8667, Japan; T Sakuta; Department of Electrical and Electronic Engineering, Kanazawa University, 2-40-20 Kodatsuno, Kanazawa, Ishikawa 920-8667, Japan
Журнал:
Journal of Physics D: Applied Physics
Дата:
2002-09-07
Аннотация:
Application of the inductively coupled thermal plasma (ICTP) technique was proposed for investigating plasma-quenching efficiency of various gases including the arc-quenching medium of SF<sub>6</sub>. The ICTP enables us to study fundamentally the effect of gas injection on thermal plasma without any impurities because it has no electrode. Seven kinds of gases including CO<sub>2</sub>, SF<sub>6</sub> and environmentally benign gases (N<sub>2</sub>, O<sub>2</sub>, air, He and H<sub>2</sub>) were injected into Ar ICTP. Spectroscopic observation was carried out in order to investigate a change in the excited state of Ar atoms due to addition of these gases. Radial distributions of the radiation intensity of Ar spectral lines and the temperature of Ar ICTP were estimated. It was found that 10% CO<sub>2</sub> addition causes a remarkable decline of the radiation intensity and temperature at any radial position, similarly to 2% SF<sub>6</sub> addition. Two-dimensional local thermal equilibrium modelling for Ar ICTP also revealed that CO<sub>2</sub> causes temperature decay more than the other gases of N<sub>2</sub>, O<sub>2</sub>, air, He and H<sub>2</sub> except SF<sub>6</sub>.
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