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Автор Zhu, Xi-Ming
Автор Chen, Wen-Cong
Автор Pu, Yi-Kang
Дата выпуска 2008-05-21
dc.description Gas temperature, electron density and electron temperature of a microwave excited microplasma are measured by optical emission spectroscopy. This microplasma is generated in the small gap of a microstrip split-ring resonator in argon at near atmospheric pressure. When less than 100 ppm of water is present in the plasma, the gas temperature can be obtained from the rotational temperature of the hydroxyl molecule (A <sup>2</sup>Σ<sup>+</sup>, v = 0) and the electron density can be measured by the Stark broadening of the hydrogen Balmer β line. According to a collisional–radiative model, the electron temperature can be estimated from the measured excitation temperature of argon 4p and 5p levels. It is found that the values of these parameters (gas temperature, electron density and temperature) increase when the gap width of the resonator is reduced. However, when the microwave power increases, these parameters, especially the electron density, do not vary significantly. Discussions on this phenomenon, being very different from that in the low-pressure bounded discharges, are provided.
Формат application.pdf
Издатель Institute of Physics Publishing
Копирайт 2008 IOP Publishing Ltd
Название Gas temperature, electron density and electron temperature measurement in a microwave excited microplasma
Тип paper
DOI 10.1088/0022-3727/41/10/105212
Electronic ISSN 1361-6463
Print ISSN 0022-3727
Журнал Journal of Physics D: Applied Physics
Том 41
Первая страница 105212
Последняя страница 105217
Аффилиация Zhu, Xi-Ming; Department of Engineering Physics, Tsinghua University, Beijing 100084, People's Republic of China
Аффилиация Chen, Wen-Cong; Department of Engineering Physics, Tsinghua University, Beijing 100084, People's Republic of China
Аффилиация Pu, Yi-Kang; Department of Engineering Physics, Tsinghua University, Beijing 100084, People's Republic of China
Выпуск 10

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