Experimental investigation of emission intensities in an inductively coupled afterglow neon plasma
Hu, Da-Wei; Pu, Yi-Kang; Hu, Da-Wei; Department of Engineering Physics, Tsinghua University, Beijing 100084, People's Republic of China; Pu, Yi-Kang; Department of Engineering Physics, Tsinghua University, Beijing 100084, People's Republic of China
Журнал:
Journal of Physics D: Applied Physics
Дата:
2009-06-07
Аннотация:
Experimental results of time-resolved optical emission intensities of atomic neon lines (585.2 and 640.2 nm) in a pulsed, low pressure (10–95 mTorr) inductively coupled afterglow neon plasma are presented. It is found that the light intensity at 585.2 nm decays exponentially but at 640.2 nm shows a typical bi-exponential decay after the rf power is turned off. Since the population of these two excited levels is generated by inelastic collisions between electrons and atomic neon (1s<sub>5</sub> metastable and ground state), the evolution of these two emission lines can also be estimated by a simple collisional–radiative (CR) model which uses time-dependent results of EEPF and the concentration of 1s<sub>5</sub> atoms, both of which can be measured by using optical absorption techniques and a Langmuir probe. It is found that the measured evolution of the emission intensity at 640.2 nm has an excellent agreement with that from the model, over a long time interval after the rf power is turned off (from 20 to 150 µs), as long as the measured EEPF is used instead of an assumed Maxwellian.
412.4Кб