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Автор Theiß, S
Автор Bibinov, N
Автор Bagcivan, N
Автор Ewering, M
Автор Awakowicz, P
Автор Bobzin, K
Дата выпуска 2010-02-24
dc.description This paper deals with the time resolved optical emission spectroscopy of a high power pulse magnetron sputtering (HPPMS) physical vapour deposition coating process. With an industrial coating unit CC800/9 HPPMS (CemeCon AG, Würselen) a (Cr,Al,Si)N coating was deposited. During the coating process, an absolute calibrated Echelle spectrometer (ESA-3000) measured the intensities of the spectral lines of chromium (Cr), aluminium (Al) and molecular bands of nitrogen (N<sub>2</sub>). Time resolved measurements enable us to calculate different parameters such as the average velocity of sputtered Al and Cr atoms or the internal plasma parameters electron density n<sub>e</sub> and electron temperature kT<sub>e</sub> with a time resolution of 20 µs. With these parameters, we determine the ionization rates of Al, Cr, Ar and Kr atoms and the deposition densities of Al and Cr atoms. Thus simulated deposition densities of 1.75 × 10<sup>20</sup> m<sup>−2</sup> s<sup>−1</sup> for chromium and 1.7 × 10<sup>22</sup> m<sup>−2</sup> s<sup>−1</sup> for aluminium are reached.
Формат application.pdf
Издатель Institute of Physics Publishing
Копирайт 2010 IOP Publishing Ltd
Название Time resolved optical emission spectroscopy of an HPPMS coating process
Тип paper
DOI 10.1088/0022-3727/43/7/075205
Electronic ISSN 1361-6463
Print ISSN 0022-3727
Журнал Journal of Physics D: Applied Physics
Том 43
Первая страница 75205
Последняя страница 75212
Аффилиация Theiß, S; Surface Engineering Institute, RWTH Aachen University, Augustinerbach 4-22, D-52062 Aachen, Germany
Аффилиация Bibinov, N; Institute for Electrical Engineering and Plasma Technology, Ruhr-Universität Bochum, D-44780 Bochum, Germany
Аффилиация Bagcivan, N; Surface Engineering Institute, RWTH Aachen University, Augustinerbach 4-22, D-52062 Aachen, Germany
Аффилиация Ewering, M; Surface Engineering Institute, RWTH Aachen University, Augustinerbach 4-22, D-52062 Aachen, Germany
Аффилиация Awakowicz, P; Institute for Electrical Engineering and Plasma Technology, Ruhr-Universität Bochum, D-44780 Bochum, Germany
Аффилиация Bobzin, K; Surface Engineering Institute, RWTH Aachen University, Augustinerbach 4-22, D-52062 Aachen, Germany
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