Мобильная версия

Доступно журналов:

3 288

Доступно статей:

3 891 637

 

Скрыть метаданые

Автор Li Dong-Sheng
Автор Chen Hong
Автор Yu Hong-Bo
Автор Zheng Xin-He
Автор Huang Qi
Автор Zhou Jun-Ming
Дата выпуска 2004-05-01
dc.description Nonpolar a-plane GaN films were grown on r-plane sapphire substrates by metalorganic chemical vapour deposition (MOCVD) under various conditions. The surface morphologies of epitaxial films are studied by atomic force microscopy. The pit density and size both decrease with the increasing growth temperature, decreasing growth pressure or V/III ratio, while the roughness of the surface increases. Formation mechanisms of the pits in the films are discussed.
Формат application.pdf
Издатель Institute of Physics Publishing
Название Growth of a-Plane GaN Films on r-Plane Sapphire Substrates by Metalorganic Chemical Vapour Deposition
Тип paper
DOI 10.1088/0256-307X/21/5/058
Electronic ISSN 1741-3540
Print ISSN 0256-307X
Журнал Chinese Physics Letters
Том 21
Первая страница 970
Последняя страница 971
Аффилиация Li Dong-Sheng; State Key Laboratory for Surface Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100080
Аффилиация Chen Hong; State Key Laboratory for Surface Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100080
Аффилиация Yu Hong-Bo; State Key Laboratory for Surface Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100080
Аффилиация Zheng Xin-He; State Key Laboratory for Surface Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100080
Аффилиация Huang Qi; State Key Laboratory for Surface Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100080
Аффилиация Zhou Jun-Ming; State Key Laboratory for Surface Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100080
Выпуск 5

Скрыть метаданые