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Автор Hou Lian-Ping
Автор Zhu Hong-Liang
Автор Zhou Fan
Автор Wang Lu-Feng
Автор Bian Jing
Автор Wang Wei
Дата выпуска 2005-07-01
dc.description A ridge laser diode monolithically integrated with a buried-ridge-structure dual-waveguide spot-size converter operating at 1.58 μm is successfully fabricated by means of low-energy ion implantation quantum well intermixing and asymmetric twin waveguide technology. The passive waveguide is optically combined with a laterally tapered active core to control the mode size. The devices emit in a single transverse and quasi single longitudinal mode with a side mode suppression ratio of 40.0 dB although no grating is fabricated in the LD region. The threshold current is 50 mA. The beam divergence angles in the horizontal and vertical directions are as small as 7.3 degrees ×18.0 degrees, respectively, resulting in 3.0 dB coupling loss with a cleaved single-mode optical fibre.
Формат application.pdf
Издатель Institute of Physics Publishing
Название Laser Diode Integrated with a Dual-Waveguide Spot-Size Converter by Low-Energy Ion Implantation Quantum Well Intermixing
Тип paper
DOI 10.1088/0256-307X/22/7/034
Electronic ISSN 1741-3540
Print ISSN 0256-307X
Журнал Chinese Physics Letters
Том 22
Первая страница 1684
Последняя страница 1686
Аффилиация Hou Lian-Ping; National Research Center for Optoelectronic Technology, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083
Аффилиация Zhu Hong-Liang; National Research Center for Optoelectronic Technology, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083
Аффилиация Zhou Fan; National Research Center for Optoelectronic Technology, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083
Аффилиация Wang Lu-Feng; National Research Center for Optoelectronic Technology, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083
Аффилиация Bian Jing; National Research Center for Optoelectronic Technology, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083
Аффилиация Wang Wei; National Research Center for Optoelectronic Technology, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083
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