Автор |
Claudio M Horowitz |
Автор |
Ezequiel V Albano |
Дата выпуска |
2001-01-26 |
dc.description |
A random-ballistic deposition model where particles are aggregated according to the rules of ballistic deposition with probability p and following a random deposition process with probability 1-p, respectively, is proposed and studied. Based on extensive numerical simulations a dynamic scaling ansatz for the interface width W(L,t,p) as a function of lattice side L, time t and p is formulated. Three new exponents, which can be linked to the standard growth exponent of ballistic deposition by means of a new scaling relation, are identified. |
Формат |
application.pdf |
Издатель |
Institute of Physics Publishing |
Название |
Dynamic scaling for a competitive growth process: random deposition versus ballistic deposition |
Тип |
paper |
DOI |
10.1088/0305-4470/34/3/303 |
Print ISSN |
0305-4470 |
Журнал |
Journal of Physics A: Mathematical and General |
Том |
34 |
Первая страница |
357 |
Последняя страница |
364 |
Аффилиация |
Claudio M Horowitz; Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas, (INIFTA), CONICET, UNLP, CIC (Bs. As), Sucursal 4, Casilla de Correo 16, (1900) La Plata. Argentina |
Аффилиация |
Ezequiel V Albano; Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas, (INIFTA), CONICET, UNLP, CIC (Bs. As), Sucursal 4, Casilla de Correo 16, (1900) La Plata. Argentina |
Выпуск |
3 |