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Автор Claudio M Horowitz
Автор Ezequiel V Albano
Дата выпуска 2001-01-26
dc.description A random-ballistic deposition model where particles are aggregated according to the rules of ballistic deposition with probability p and following a random deposition process with probability 1-p, respectively, is proposed and studied. Based on extensive numerical simulations a dynamic scaling ansatz for the interface width W(L,t,p) as a function of lattice side L, time t and p is formulated. Three new exponents, which can be linked to the standard growth exponent of ballistic deposition by means of a new scaling relation, are identified.
Формат application.pdf
Издатель Institute of Physics Publishing
Название Dynamic scaling for a competitive growth process: random deposition versus ballistic deposition
Тип paper
DOI 10.1088/0305-4470/34/3/303
Print ISSN 0305-4470
Журнал Journal of Physics A: Mathematical and General
Том 34
Первая страница 357
Последняя страница 364
Аффилиация Claudio M Horowitz; Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas, (INIFTA), CONICET, UNLP, CIC (Bs. As), Sucursal 4, Casilla de Correo 16, (1900) La Plata. Argentina
Аффилиация Ezequiel V Albano; Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas, (INIFTA), CONICET, UNLP, CIC (Bs. As), Sucursal 4, Casilla de Correo 16, (1900) La Plata. Argentina
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