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Автор Y Liu
Автор H Luo
Автор T Yang
Автор X Leng
Автор X F Wu
Автор J W Lin
Автор Z H Wang
Автор H M Luo
Автор S Y Ding
Дата выпуска 2002-03-01
dc.description We have measured the temperature dependence of the resistance of Tl<sub>2</sub>Ba<sub>2</sub>CaCu<sub>2</sub>O<sub>8+x</sub> (Tl-2212) thin film at various magnetic fields parallel and normal to the c-axis. Then the U(H) relationship and irreversibility line were obtained. An important parameter n in the material equation of the Tl-2212 thin film is obtained from the U(H) relationship. The V–I characteristic curves at different applied magnetic fields and temperatures were also measured. To testify the equivalence of the two measurements, we calculated V–I curves of the same thin film by solving the flux creep equation with the obtained material equation. A comparison between the independently measured and calculated V–I curves shows a satisfactory agreement. It is, therefore, concluded that we can combine the resistive broadening R–T measurement, which is conducted at a low current density and high temperature and the V–I curve, which can be carried out at a much lower temperature, expanding the range of temperature and current density in exploring the dynamics.
Формат application.pdf
Издатель Institute of Physics Publishing
Название Transport properties in Tl-2212 film
Тип paper
DOI 10.1088/0953-2048/15/3/318
Electronic ISSN 1361-6668
Print ISSN 0953-2048
Журнал Superconductor Science and Technology
Том 15
Первая страница 375
Последняя страница 380
Аффилиация Y Liu; Department of Physics, National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210093, Peopleʼs Republic of China
Аффилиация H Luo; Department of Physics, National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210093, Peopleʼs Republic of China
Аффилиация T Yang; Department of Physics, National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210093, Peopleʼs Republic of China
Аффилиация X Leng; Department of Physics, National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210093, Peopleʼs Republic of China
Аффилиация X F Wu; Department of Physics, National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210093, Peopleʼs Republic of China
Аффилиация J W Lin; Department of Physics, National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210093, Peopleʼs Republic of China
Аффилиация Z H Wang; Department of Physics, National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210093, Peopleʼs Republic of China
Аффилиация H M Luo; Department of Physics, National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210093, Peopleʼs Republic of China
Аффилиация S Y Ding; Department of Physics, National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210093, Peopleʼs Republic of China
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