| Автор | Sascha Sadewasser |
| Автор | Philippe Carl |
| Автор | Thilo Glatzel |
| Автор | Martha Ch Lux-Steiner |
| Дата выпуска | 2004-02-01 |
| dc.description | We use highly oriented pyrolytic graphite (HOPG) with a submonolayer coverage of C<sub>60</sub> and monitor the step height from C<sub>60</sub> to HOPG as a function of dc bias for non-contact atomic force microscopy (NC-AFM). We find a strong dependence of the step height on dc bias between tip and sample surface. The step height is modified by uncompensated electrostatic forces, resulting from the work function difference of meV between C<sub>60</sub> and HOPG, as determined by Kelvin probe force microscopy (KPFM) measurements. In comparison, steps from C<sub>60</sub> to C<sub>60</sub> or from HOPG to HOPG show no dependence on dc bias. This effect is well described by simulations of the electrostatic interaction between tip and sample. The results clearly demonstrate the influence of uncompensated electrostatic forces on height measurements in NC-AFM, and show that correct height determination requires the use of KPFM with active control of the bias voltage. |
| Формат | application.pdf |
| Издатель | Institute of Physics Publishing |
| Копирайт | IOP Publishing Ltd |
| Название | Influence of uncompensated electrostatic force on height measurements in non-contact atomic force microscopy |
| Тип | paper |
| DOI | 10.1088/0957-4484/15/2/004 |
| Electronic ISSN | 1361-6528 |
| Print ISSN | 0957-4484 |
| Журнал | Nanotechnology |
| Том | 15 |
| Первая страница | S14 |
| Последняя страница | S18 |
| Аффилиация | Sascha Sadewasser; Hahn–Meitner Institut, Glienicker Straße 100, 14109 Berlin, Germany |
| Аффилиация | Philippe Carl; Hahn–Meitner Institut, Glienicker Straße 100, 14109 Berlin, Germany |
| Аффилиация | Thilo Glatzel; Hahn–Meitner Institut, Glienicker Straße 100, 14109 Berlin, Germany |
| Аффилиация | Martha Ch Lux-Steiner; Hahn–Meitner Institut, Glienicker Straße 100, 14109 Berlin, Germany |
| Выпуск | 2 |
