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Автор Liu, Zhihong
Автор Zhang, Hui
Автор Wang, Lei
Автор Yang, Deren
Дата выпуска 2008-09-17
dc.description Nickel silicide nanowire arrays have been achieved by the decomposition of SiH<sub>4</sub> on Ni foil at 650 °C. It is indicated that the nickel silicide nanowires consist of roots with diameter of about 100–200 nm and tips with diameter of about 10–50 nm. A Ni diffusion controlled mechanism is proposed to explain the formation of the nickel silicide nanowires. Field emission measurement shows that the turn-on field of the nickel silicide nanowire arrays is low, at about 3.7 V µm<sup>−1</sup>, and the field enhancement factor is as high as 4280, so the arrays have promising applications as emitters.
Формат application.pdf
Издатель Institute of Physics Publishing
Копирайт IOP Publishing Ltd
Название Controlling the growth and field emission properties of silicide nanowire arrays by direct silicification of Ni foil
Тип paper
DOI 10.1088/0957-4484/19/37/375602
Electronic ISSN 1361-6528
Print ISSN 0957-4484
Журнал Nanotechnology
Том 19
Первая страница 375602
Последняя страница 375605
Аффилиация Yang, Deren;
Аффилиация Liu, Zhihong; State Key Lab of Silicon Materials and Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, People’s Republic of China
Аффилиация Zhang, Hui; State Key Lab of Silicon Materials and Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, People’s Republic of China
Аффилиация Wang, Lei; State Key Lab of Silicon Materials and Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, People’s Republic of China
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