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Автор Liang, B L
Автор Mazur, Yu I
Автор Kunets, Vas P
Автор Wang, Zh M
Автор Salamo, G J
Автор DeCuir, E A
Автор Passmore, B
Автор Manasreh, M O
Дата выпуска 2008-02-13
dc.description Photoluminescence (PL) of InAs/GaAs surface quantum dots (QDs) is enhanced by implanting a silicon-doped GaAs interlayer beneath surface QDs. It is observed that setting the doping concentration to 2.3 × 10<sup>17</sup> cm<sup>−3</sup> in the doped GaAs interlayer spaced 10 nm from the surface QDs results in optimal QD PL, i.e., highest intensity and narrowest linewidth. This improvement is attributed to the effective enhancement of the photo-excited carrier capture into the surface QDs and a filling of surface states due to free-carrier transfer from the doped GaAs layer to the surface QDs.
Формат application.pdf
Издатель Institute of Physics Publishing
Копирайт IOP Publishing Ltd
Название Enhanced photoluminescence from InAs/GaAs surface quantum dots by using a Si-doped interlayer
Тип paper
DOI 10.1088/0957-4484/19/6/065705
Electronic ISSN 1361-6528
Print ISSN 0957-4484
Журнал Nanotechnology
Том 19
Первая страница 65705
Последняя страница 65709
Аффилиация Liang, B L; Department of Physics, University of Arkansas, Fayetteville, AR 72701, USA
Аффилиация Mazur, Yu I; Department of Physics, University of Arkansas, Fayetteville, AR 72701, USA
Аффилиация Kunets, Vas P; Department of Physics, University of Arkansas, Fayetteville, AR 72701, USA
Аффилиация Wang, Zh M; Department of Physics, University of Arkansas, Fayetteville, AR 72701, USA
Аффилиация Salamo, G J; Department of Physics, University of Arkansas, Fayetteville, AR 72701, USA
Аффилиация DeCuir, E A; Department of Electrical Engineering, University of Arkansas, Fayetteville, AR 72701, USA
Аффилиация Passmore, B; Department of Electrical Engineering, University of Arkansas, Fayetteville, AR 72701, USA
Аффилиация Manasreh, M O; Department of Electrical Engineering, University of Arkansas, Fayetteville, AR 72701, USA
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