Nanopattern insert molding
Kim, S H; Jeong, J H; Youn, J R; Kim, S H; Research Institute of Advanced Materials (RIAM), Department of Materials Science and Engineering, Seoul National University, 56-1, Shinlim-Dong, Gwanak-gu, Seoul, 151-744, Korea; Jeong, J H; Nano-Mechanical Systems Research Center, Intelligent and Precision Machinery Research Division, Korea Institute of Machinery and Materials, 104 Sinseongno, Yuseong-gu, Daejeon, 305-343, Korea; Youn, J R; Research Institute of Advanced Materials (RIAM), Department of Materials Science and Engineering, Seoul National University, 56-1, Shinlim-Dong, Gwanak-gu, Seoul, 151-744, Korea
Журнал:
Nanotechnology
Дата:
2010-05-21
Аннотация:
A new method was investigated to produce nanopatterns on polymeric surfaces with high resolution, good productivity, and low cost. It has certain advantages when compared with such conventional techniques as nanoimprint lithography (NIL), hot embossing, and injection molding. Polyvinyl alcohol (PVA) was utilized for preparation of the stamp with nanopatterns on its surface. The nanoimprinted PVA film was inserted into the cavity and the polymer melt was injected into the mold. Nanopatterns with pillars smaller than 100 nm were produced on the polymeric surface. The water soluble PVA film was used as the inserted template to overcome the difficulties of releasing the nanopatterned film from the substrate.
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