A comparative study on the performance of a xenon capillary Z-pinch EUV lithography light source using a pinhole camera
Song, Inho; Iwata, Kazuhiro; Homma, Yusuke; Mohanty, Smruti R; Watanabe, Masato; Kawamura, Toru; Okino, Akitoshi; Yasuoka, Koichi; Horioka, Kazuhiko; Hotta, Eiki; Song, Inho; Department of Energy Sciences, Tokyo Institute of Technology, Nagatsuta 4259, Midori-ku, Yokohama 226-8502, Japan; Iwata, Kazuhiro; Department of Energy Sciences, Tokyo Institute of Technology, Nagatsuta 4259, Midori-ku, Yokohama 226-8502, Japan; Homma, Yusuke; Department of Energy Sciences, Tokyo Institute of Technology, Nagatsuta 4259, Midori-ku, Yokohama 226-8502, Japan; Mohanty, Smruti R; Centre of Plasma Physics, Sonapur, Kamrup-782 402, Assam, India; Watanabe, Masato; Department of Energy Sciences, Tokyo Institute of Technology, Nagatsuta 4259, Midori-ku, Yokohama 226-8502, Japan; Kawamura, Toru; Department of Energy Sciences, Tokyo Institute of Technology, Nagatsuta 4259, Midori-ku, Yokohama 226-8502, Japan; Okino, Akitoshi; Department of Energy Sciences, Tokyo Institute of Technology, Nagatsuta 4259, Midori-ku, Yokohama 226-8502, Japan; Yasuoka, Koichi; Department of Electrical and Electronic Engineering, Tokyo Institute of Technology, O-okayama 2-12-1, Meguro-ku, Tokyo 152-8552, Japan; Horioka, Kazuhiko; Department of Energy Sciences, Tokyo Institute of Technology, Nagatsuta 4259, Midori-ku, Yokohama 226-8502, Japan; Hotta, Eiki; Department of Energy Sciences, Tokyo Institute of Technology, Nagatsuta 4259, Midori-ku, Yokohama 226-8502, Japan
Журнал:
Plasma Sources Science and Technology
Дата:
2006-08-01
Аннотация:
A pinhole camera has been employed to study the performance of a xenon capillary Z-pinch extreme ultraviolet (EUV) lithography light source driven by different dI/dt discharge current pulses. The performance of the EUV source in terms of dimension, intensity, collection efficiency and stability was specifically investigated by varying the experimental conditions such as the supplying gas pressure and dI/dt of the discharge current. Specific features, such as ring shape (annular profile) pinhole images and symmetrical and stable emission in the high dI/dt discharge current, have been observed or confirmed experimentally. Our results support the fact that the high dI/dt and short discharge currents have better EUV emission characteristics for EUV lithography compared with the low dI/dt discharge current.
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