| Автор | Nishikawa, T |
| Автор | Mitani, T |
| Дата выпуска | 2003-01-01 |
| dc.description | This paper proposes a new technology for the fabrication of molecular devices using nanotechnology based on liquid and surface sciences recently developed, such as the direct patterning of solid surfaces using the difference of hydrophobic and hydrophilic properties of self-assembled mono-layers and self-assembly films of metal nanoparticles, the fine fabrication of films by the method of Liquid Source Misted Chemical Deposition, and the Langmuir–Blodgett self-assembly films. In these liquid-based technologies, various kinds of organic compounds in solutions, including biological systems, can be used as functional materials in molecular devices. In addition, it has been found that the insulating inorganic films obtained by catalytic chemical vapor deposition are quite effective in the protection of molecular devices against water and/or oxygen. We confirm, from the experimental results presented in this report, that this new approach is practically promising in future. |
| Формат | application.pdf |
| Издатель | Institute of Physics Publishing |
| Копирайт | © 2003 Published by Elsevier Ltd |
| Название | A new approach to molecular devices using SAMs, LSMCD and Cat-CVD |
| Тип | paper |
| DOI | 10.1016/S1468-6996(03)00013-5 |
| Electronic ISSN | 1878-5514 |
| Print ISSN | 1468-6996 |
| Журнал | Science and Technology of Advanced Materials |
| Том | 4 |
| Первая страница | 81 |
| Последняя страница | 89 |
| Аффилиация | Nishikawa, T; Japan Advanced Institute of Science and Technology (JAIST), Tatsunokuchi, Ishikawa-ken 923-1292, Japan; SEIKO EPSON Co., Technology Platform Research center, Fujimimachi, Nagano-ken 399-0293, Japan |
| Аффилиация | Mitani, T; Japan Advanced Institute of Science and Technology (JAIST), Tatsunokuchi, Ishikawa-ken 923-1292, Japan; |
| Выпуск | 1 |
