Мобильная версия

Доступно журналов:

3 288

Доступно статей:

3 891 637

 

Скрыть метаданые

Автор A Wiatrowski
Автор W M Posadowski
Автор Z J Radzimski
Дата выпуска 2008-03-01
dc.description At standard magnetron sputtering conditions (argon pressure ~0.5 Pa) inert gas particles are often entrapped in the formed films. Inert gas contamination can be eliminated by using the self-sustained magnetron sputtering process because it is done in the absence of the inert gas atmosphere. The self-sustained sputtering (SSS) gives also a unique condition during the transport of sputtered particles to the substrate. It is especially useful for filling high aspect ratio submicron scale structures for microelectronics. So far it has been shown that the self-sputtering process can be sustained in the DC operation mode (DC-SSS) only. The main disadvantage of DC-SSS process is instability related to possible arc formation. Usage of pulsed sputtering, similarly to reactive pulsed magnetron sputtering, could eliminate this problem. In this paper results of pulsed-DC self-sustained magnetron sputtering (pulsed DC-SSS) of copper are presented for the first time. The planar magnetron equipped with a 50 mm in diameter and 6 mm thick copper target was powered by DC-power supply modulated by power switch. The maximum target power was about 11 kW (~550W/cm<sup>2</sup>). The magnetron operation was investigated as a function of pulsing frequency (20–100 kHz) and duty factor (50–90%). The discharge extinction pressure was determined for these conditions. The plasma emission spectra (400–410nm range) and deposition rates were observed for both DC and pulsed DC sustained self-sputtering processes. The presented results illustrate that stable pulsed DC-SSS process can be obtained at pulsing frequency in the range of 60–100 kHz and duty factor of 70–90%.
Формат application.pdf
Издатель Institute of Physics Publishing
Копирайт © 2008 IOP Publishing Ltd
Название Pulsed-DC selfsputtering of copper
Тип paper
DOI 10.1088/1742-6596/100/6/062004
Electronic ISSN 1742-6596
Print ISSN 1742-6588
Журнал Journal of Physics: Conference Series
Том 100
Первая страница 62004
Последняя страница 62007
Выпуск 6

Скрыть метаданые