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Автор Z I Alexieva
Автор Z S Nenova
Автор V S Bakardjieva
Автор M M Milanova
Автор Hr M Dikov
Дата выпуска 2010-04-01
dc.description A double-layer structure of Al<sub>2</sub>O<sub>3</sub> over ZrO<sub>2</sub> film is studied. Minimization of the average weighted reflectance is carried out to optimize the thickness of the two layers in the antireflection coating. An optimal value of 2.17% for the weighted average reflection is estimated. The optimal thicknesses of the layers are 49 nm for the bottom and 45 nm for the top layer. Low temperature spin coating technique is used to deposit ZrO<sub>2</sub> and Al<sub>2</sub>O<sub>3</sub> films from sol gel solutions on polished silicon wafers, GaAs multilayer heterostructures and AlGaAs/GaAs solar cells. The density of the short-circuit photocurrent increases from 25 mA.cm<sup>−2</sup> for solar cells without an antireflection coating to 36 mA.cm<sup>−2</sup> for those with a double layer coating.
Формат application.pdf
Издатель Institute of Physics Publishing
Копирайт © 2010 IOP Publishing Ltd
Название Antireflection coatings for GaAs solar cell applications
Тип paper
DOI 10.1088/1742-6596/223/1/012045
Electronic ISSN 1742-6596
Print ISSN 1742-6588
Журнал Journal of Physics: Conference Series
Том 223
Первая страница 12045
Последняя страница 12048
Выпуск 1

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