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Автор M H Hong
Автор Y Lin
Автор G X Chen
Автор L S Tan
Автор Q Xie
Автор B Lukyanchuk
Автор L P Shi
Автор T C Chong
Дата выпуска 2007-04-01
dc.description Pulsed laser irradiation in near field is one of effective ways to break optical diffraction limit for surface nano-structuring. Femtosecond laser (400 nm, 100 fs) irradiation through near-field scanning optical microscopy for sub-50 nm resolution is studied. Application of transparent particles' mask by the self-assembly for nano-hole array fabrication is also investigated. It is attributed to light enhancement in near field through the particles.
Формат application.pdf
Издатель Institute of Physics Publishing
Копирайт © 2007 IOP Publishing Ltd
Название Nano-patterning by pulsed laser irradiation in near field
Тип paper
DOI 10.1088/1742-6596/59/1/014
Electronic ISSN 1742-6596
Print ISSN 1742-6588
Журнал Journal of Physics: Conference Series
Том 59
Первая страница 64
Последняя страница 67
Выпуск 1

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