Monte Carlo simulation of scattering-induced negative differential resistance in AlGaAs/GaAs quantum wells
M A R Al-Mudares; B K Ridley; M A R Al-Mudares; Dept. of Phys., Essex Univ., Colchester, UK; B K Ridley; Dept. of Phys., Essex Univ., Colchester, UK
Журнал:
Journal of Physics C: Solid State Physics
Дата:
1986-06-20
Аннотация:
A detailed Monte Carlo simulation of hot-electron transport at 77K in a AlGaAs/GaAs quantum well has been carried out in the bulk-phonon approximation taking into account quasi-two-dimensional electron-electron scattering along with other quasi-two-dimensional scattering mechanisms and the effects of degeneracy, but neglecting dynamic screening and plasmon interactions. It is shown that for an intermediate range of AlGaAs donor concentrations (10<sup>17</sup>-10<sup>18</sup> cm<sup>-3</sup>) a scattering-induced negative differential resistance (SI-NDR) occurs as previously predicted. The threshold for the onset of SI-NDR is significantly less than the thresholds for either inter-valley or real-space transfer; hence the latter mechanisms are thereby delayed to higher fields. It is pointed out that SI-NDR has a much faster relaxation time than either inter-valley or real-space transfer.
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