Characterization of SrTiO<sub>3</sub> thin films prepared by RF magnetron sputtering
Seung Hee Nam; Neung Ho Cho; Ho Gi Kim; Seung Hee Nam; Dept. of Mater. Sci. & Eng., Korea Adv. Inst. of Sci. & Technol., Seoul, South Korea; Neung Ho Cho; Dept. of Mater. Sci. & Eng., Korea Adv. Inst. of Sci. & Technol., Seoul, South Korea; Ho Gi Kim; Dept. of Mater. Sci. & Eng., Korea Adv. Inst. of Sci. & Technol., Seoul, South Korea
Журнал:
Journal of Physics D: Applied Physics
Дата:
1992-04-14
Аннотация:
Polycrystalline SrTiO<sub>3</sub> thin films have been prepared on Si(100) substrates by RF magnetron sputtering. The films were deposited at 400 degrees C and were annealed at 600 degrees C. The films had a dense microstructure with fine grains. The electrical properties of the films were dramatically controlled with annealing. From the result of the capacitance-voltage (C-V) characteristics the dielectric constant and the flat band voltage of the annealed films were measured to be 75 and -0.31 V, respectively. These oxide thin films with high dielectric constant are potentially useful in ULSI applications.
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